This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Mitsubishi Jukogyo Kabushiki Kaisha. Active years: 1993-1995.
Company Filing History:
Years Active: 1993-1995
Title: Kazutoshi Hamamoto: Innovator in Plasma CVD Technology
Introduction
Kazutoshi Hamamoto is a prominent inventor based in Nagasaki, Japan. He has made significant contributions to the field of plasma chemical vapor deposition (CVD) technology. With a total of 2 patents, his work focuses on enhancing the quality and efficiency of thin film production.
Latest Patents
Hamamoto's latest patents include a Plasma CVD apparatus and a Plasma-chemical vapor-phase epitaxy system. The Plasma CVD apparatus features a discharge electrode designed as a single line member bent in a U shape. This innovative design allows the substrate to be processed in parallel to the discharge electrode, resulting in a stronger electric field and a more uniform thickness of the product film. The film can be formed at high speeds, significantly improving production efficiency.
The Plasma-chemical vapor-phase epitaxy system is designed to produce large thin films of high quality. This system includes a vacuum container with a quartz glass window and an antenna-type discharge electrode positioned outside the container. By exciting the reaction gas with high-frequency electromagnetic waves, this system can create large thin films with excellent quality.
Career Highlights
Kazutoshi Hamamoto is associated with Mitsubishi Jukogyo Kabushiki Kaisha, where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of CVD systems, making them more efficient and effective for industrial applications.
Collaborations
Throughout his career, Hamamoto has collaborated with notable colleagues such as Satoshi Uchida and Masayoshi Murata. These collaborations have further enriched his research and development efforts in the field of plasma technology.
Conclusion
Kazutoshi Hamamoto's contributions to plasma CVD technology have positioned him as a key figure in the industry. His innovative patents and ongoing work at Mitsubishi Jukogyo Kabushiki Kaisha continue to influence the development of high-quality thin films.