Company Filing History:
Years Active: 2005-2012
Title: Kazushige Shiina: Innovator in Chemical Vapor Deposition Technology
Introduction
Kazushige Shiina is a prominent inventor based in Tokyo, Japan, known for his contributions to the field of chemical vapor deposition technology. With a total of two patents to his name, Shiina has made significant advancements that enhance the quality and efficiency of semiconductor manufacturing processes.
Latest Patents
Shiina's latest patents include a chemical vapor deposition apparatus and a film-forming device with a substrate rotating mechanism. The chemical vapor deposition apparatus features a susceptor for mounting substrates, a heater for heating the substrates, and a light-transmitting ceramics plate that ensures stable film formation without compromising the quality of semiconductor films, even when using corrosive gases. The film-forming device incorporates a circular disk susceptor and a mechanism for rotating substrates, allowing for a precise film-forming process through simultaneous rotation and revolution of the substrates.
Career Highlights
Throughout his career, Kazushige Shiina has worked with notable companies such as E.E. Technologies Inc. and Japan Pionics Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies in the semiconductor industry.
Collaborations
Shiina has collaborated with esteemed colleagues, including Junji Komeno and Tatsuya Ohori, further enriching his work and expanding the impact of his inventions.
Conclusion
Kazushige Shiina's innovative contributions to chemical vapor deposition technology have positioned him as a key figure in the semiconductor industry. His patents reflect a commitment to advancing manufacturing processes and improving the quality of semiconductor films.