The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2005

Filed:

Dec. 05, 2001
Applicants:

Junji Komeno, Tokyo, JP;

Kazushige Shiina, Tokyo, JP;

Inventors:

Junji Komeno, Tokyo, JP;

Kazushige Shiina, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21205 ; H01L 21285 ; C23C 1600 ;
U.S. Cl.
CPC ...
Abstract

A film-forming device with a substrate rotating mechanism includes a susceptorin the form of a circular disk; a base platepositioned below the susceptorand rotatably retaining the susceptor; a revolution generating sectionrotating the susceptorat the outer periphery of the susceptor; a plurality of substrate tray retaining sectionsarranged on the susceptor; a plurality of annular substrate traysrotatably supported in the corresponding substrate tray retaining sections; a rotation generating sectionrotating the substrate trays; and a plurality of substrates W retained in the substrate trays. The substrates W are revolved by the rotation of the susceptorand rotated by the rotation of the substrate traysto apply a certain film-forming process. The substrates W are rotated and revolved by one or more revolution generating sectionand the rotation generating section


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