Kazuo Shimoyama

Title: Kazuo Shimoyama: Innovator in Semiconductor Technology

Introduction

Kazuo Shimoyama is a prominent inventor based in Nagano, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His innovative approaches have led to advancements in the manufacturing of reliable semiconductor devices.

Latest Patents

Shimoyama's latest patents focus on a semiconductor device and its manufacturing method. The process involves forming top surface structures on a thin semiconductor wafer, which is affixed to a supporting substrate using double-sided adhesive tape. A trench is created from the bottom surface of the wafer through wet anisotropic etching, exposing the side walls. An isolation layer with a different conductivity type is formed on the side walls, which helps in holding a reverse breakdown voltage. This is achieved simultaneously with the formation of a collector region by ion implantation, followed by laser annealing. The resulting side walls have a V-shaped or trapezoidal cross-section, with an angle of 30-70° relative to the supporting substrate. After the removal of the adhesive tape, high-reliability semiconductor chips are produced.

Career Highlights

Throughout his career, Kazuo Shimoyama has worked with notable companies such as Fuji Electric Co., Ltd. and Fuji Electric Systems Co., Ltd. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.

Collaborations

Shimoyama has collaborated with esteemed colleagues, including Haruo Nakazawa and Manabu Takei. Their combined expertise has contributed to the successful development of innovative semiconductor technologies.

Conclusion

Kazuo Shimoyama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry, paving the way for future advancements in semiconductor devices.