Location History:
- Niigata, JP (1989 - 1995)
- Nigata, JP (1994 - 1997)
- Niigata-ken, JP (1996 - 1997)
- Joetsu, JP (1980 - 1998)
- Nakakubiki-gun, JP (1997 - 1998)
Company Filing History:
14 out of 5,978 
1 out of 37 Years Active: 1980-1998
Title: Kazumasa Maruyama: Innovator in Resist Technology
Introduction
Kazumasa Maruyama is a prominent inventor based in Nakakubiki-gun, Japan. He has made significant contributions to the field of resist technology, holding a total of 14 patents. His work focuses on developing advanced materials and methods for creating precise resist patterns used in various applications.
Latest Patents
Maruyama's latest patents include a resist composition with a polymeric dissolution inhibitor and alkali. This composition features an alkali-soluble resin, typically a partially t-butoxycarbonylated polyhydroxystyrene, a p-butoxystyrene/t-butylacrylate copolymer, or a p-butoxystyrene/maleic anhydride copolymer as a dissolution inhibitor. It also incorporates an iodonium or sulfonium salt as a photoacid generator, which is effective for forming a resist film that can be precisely and finely patterned using high-energy radiation such as a KrF excimer laser. Another notable patent is a method of forming a resist pattern utilizing fluorinated resin. This method involves forming a photoresist layer on a substrate, applying a transparent anti-reflective film made from a fluorinated resin, exposing the resist layer to light, and developing the photoresist layer.
Career Highlights
Throughout his career, Maruyama has worked with notable companies such as Shin-Etsu Chemical Co., Ltd. and Shin-Etsu Bio, Inc. His expertise in resist technology has positioned him as a key figure in the development of innovative materials for the semiconductor industry.
Collaborations
Maruyama has collaborated with esteemed colleagues, including Toshinobu Ishihara and Katsuya Takemura. These partnerships have further enhanced his research and development efforts in the field of resist technology.
Conclusion
Kazumasa Maruyama's contributions to resist technology and his impressive portfolio of patents highlight his role as an influential inventor. His work continues to impact the semiconductor industry, paving the way for advancements in precision patterning techniques.