The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1998
Filed:
Jul. 01, 1996
Katsuya Takemura, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Satoshi Watanabe, Nakakubiki-gun, JP;
Kazumasa Maruyama, Nakakubiki-gun, JP;
Hirofumi Kishita, Usui-gun, JP;
Kouichi Yamaguchi, Usui-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A method of forming a resist pattern comprising forming a photoresist layer on a substrate, forming a transparent anti-reflective film on said photoresist layer by applying an anti-reflective material onto said photoresist layer, said anti-reflective material comprising a fluorinated resin which is soluble in an organic hydrocarbon solvent, exposing a light to said resist layer through said transparent anti-reflective film, removing said anti-reflective film using an organic hydrocarbon solvent, and developing said photoresist layer.