The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 1997
Filed:
Jan. 27, 1995
Satoshi Watanabe, Nakakubiki-gun, JP;
Youichi Ohsawa, Nakakubiki-gun, JP;
Toshinobu Ishihara, Nakakubiki-gun, JP;
Kazumasa Maruyama, Nakakubiki-gun, JP;
Yoshihumi Takeda, Nakakubiki-gun, JP;
Junji Shimada, Nakakubiki-gun, JP;
Fujio Yagihashi, Kawasaki, JP;
Katsuya Takemura, Nakakubiki-gun, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Trifluoromethanesulfonic and p-toluenesulfonic acid bis- or tris(p-tert-butoxyphenyl)sulfonium salts are novel. They are prepared from bis(p-tert-butoxyphenyl)sulfoxide which is also novel. A chemically amplified positive resist composition which contains the sulfonium salt as a photo-acid generator is highly sensitive to deep-UV rays, electron beams and X-rays, can be developed with alkaline aqueous solution to form a pattern, and is thus suitable for use in a fine patterning technique.