This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Kazuki Oshima - Innovator in Plasma Processing Technology
Introduction
Kazuki Oshima is a notable inventor based in Kurokawagun, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus.
Latest Patents
Kazuki Oshima holds 1 patent for his invention of a plasma processing apparatus. This apparatus includes a plasma processing chamber, a substrate support with a lower electrode, and an upper electrode positioned above the substrate support. The design features a first RF signal generator that produces a first RF signal with varying power levels during different states in a repetition period. Additionally, a second RF signal generator is included, which also generates a second RF signal with distinct power levels during the operational states.
Career Highlights
Kazuki Oshima is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to further his research and development in plasma processing technologies.
Collaborations
Kazuki collaborates with Torai Iwasa, who is also involved in the field of plasma processing. Their partnership enhances the innovative capabilities within their projects.
Conclusion
Kazuki Oshima's contributions to plasma processing technology exemplify the spirit of innovation. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing this important field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile