Kazuhsi Tomita

Title: Kazuhsi Tomita: Innovator in Anisotropic Etching Technology

Introduction

Kazuhsi Tomita is a notable inventor based in Kawaguchi, Japan. He is recognized for his contributions to the field of semiconductor manufacturing, particularly in the area of anisotropic etching methods. His innovative approach has significantly impacted the efficiency and effectiveness of semiconductor processing.

Latest Patents

Kazuhsi Tomita holds a patent for an anisotropic etching method and apparatus. This invention features a parallel-plate plasma etching apparatus that includes a susceptor electrode and a shower electrode arranged within a process chamber. A semiconductor wafer is placed on the susceptor electrode, while the shower electrode is designed with a cooling block to create a temperature gradient. This gradient ensures that the central portion of the effective electrode is cooler than the peripheral portion, which helps maintain the uniformity of etching on the wafer. The design of the shower region and the effective electrode portion is meticulously calculated to optimize the etching process.

Career Highlights

Throughout his career, Kazuhsi Tomita has worked with prominent companies in the semiconductor industry, including Hitachi, Ltd. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in semiconductor technology.

Collaborations

Kazuhsi Tomita has collaborated with esteemed colleagues such as Masayuki Kojima and Yoshikazu Ito. These partnerships have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

Kazuhsi Tomita's work in anisotropic etching has made a lasting impact on semiconductor manufacturing. His innovative methods and collaborations with industry leaders highlight his importance as an inventor in this field.