Tokyo, Japan

Kazuhisa Ishii

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignee: Nissan Chemical Industries Limited. Active years: 2002-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhisa Ishii. Retrieved from https://idiyas.com/inventor/kazuhisa-ishii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 26(Granted Patents)


Location History:

  • Chiba, JP (2002)
  • Funabashi, JP (2004)
  • Chiyoda-ku, JP (2008 - 2011)

Company Filing History:


Years Active: 2002-2011

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4 patents (USPTO):Explore Patents

Title: Kazuhisa Ishii: Innovator in Semiconductor Technology

Introduction

Kazuhisa Ishii is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of gap fill materials for lithography processes. With a total of 4 patents to his name, Ishii's work has been instrumental in enhancing production efficiency in semiconductor manufacturing.

Latest Patents

Ishii's latest patents include innovative compositions for gap fill materials used in lithography. One of his notable inventions is an acrylic polymer-containing gap fill material forming composition. This composition is designed for use in the dual damascene process and is characterized by its excellent flattening and fill properties. It involves coating a photoresist on a semiconductor substrate with a specific aspect ratio and transferring an image using lithography techniques. The composition comprises a polymer, a crosslinking agent, and a solvent.

Another significant patent is the alkali-soluble gap fill material forming composition for lithography. This invention also targets the dual damascene process and aims to improve production efficiency. The composition is applied to a substrate before the photoresist coating and includes a polymer with hydroxy or carboxy groups, along with a crosslinking agent. The resulting gap fill material layer can be effectively etched back using an alkaline aqueous solution.

Career Highlights

Kazuhisa Ishii is currently associated with Nissan Chemical Industries Limited, where he continues to innovate in the field of semiconductor materials. His expertise and contributions have positioned him as a key figure in the industry, driving advancements in manufacturing processes.

Collaborations

Ishii has collaborated with notable colleagues, including Takayasu Nihira and Hiroyoshi Fukuro. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Kazuhisa Ishii's work in semiconductor technology, particularly in the development of gap fill materials for lithography, showcases his innovative spirit and dedication to improving production efficiency. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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