Hitachinaka, Japan

Kazuhiro Ueda

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignees: Hitachi-High-Technologies Corporation, Hitachi-Science Systems, Ltd.. Active years: 2006-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiro Ueda. Retrieved from https://idiyas.com/inventor/kazuhiro-ueda-5hlq7fy1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 3 

% Patents Active = 33.3

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2006-2013

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3 patents (USPTO):Explore Patents

Title: Kazuhiro Ueda: Innovator in Electron Beam Technology

Introduction

Kazuhiro Ueda is a notable inventor based in Hitachinaka, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 3 patents. His work focuses on improving sample observation conditions and enhancing the functionality of scanning electron microscopes.

Latest Patents

Ueda's latest patents include a method and apparatus for setting sample observation conditions, as well as a method and apparatus for sample observation. These innovations allow for efficient sample observation by quickly identifying optimal conditions while minimizing damage to the sample. The process involves using an electron beam apparatus to acquire a profile of the sample under reference conditions, followed by a judgment on whether the profile falls within a predetermined range. This leads to the establishment of optimal observation conditions based on the results.

Another significant patent is related to the alignment and astigmatism correction for scanning electron microscopes. This method prevents errors that may arise from specific specimen conditions. By comparing optimal values from standard samples with those from observation target samples, Ueda's method ensures precise adjustments for alignment and astigmatism correction.

Career Highlights

Throughout his career, Kazuhiro Ueda has worked with prominent companies such as Hitachi High-Technologies Corporation and Hitachi Science Systems, Ltd. His experience in these organizations has allowed him to refine his expertise in electron beam technology and contribute to advancements in the field.

Collaborations

Ueda has collaborated with notable colleagues, including Katsuhiro Sasada and Tatsuya Maeda. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Kazuhiro Ueda's contributions to electron beam technology and his innovative patents have significantly impacted the field of sample observation. His work continues to influence advancements in microscopy and related technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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