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For the Inventor, By the Inventor

Shizuoka, Japan

Kazuhiro Shiba

This inventor holds 10 USPTO granted patents. Top assignees: Toshiba Kikai Kabushiki Kaisha, Nuflare Technology, Inc.. Active years: 2003-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiro Shiba. Retrieved from https://idiyas.com/inventor/kazuhiro-shiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10

% Patents Active = 60.0

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 63(Granted Patents)


Location History:

  • Shizuoka-ken, JP (2004 - 2005)
  • Numazu, JP (2003 - 2006)
  • Shizuoka, JP (2005 - 2014)

Company Filing History:

goldMedal8 out of 746 
 
Toshiba Kikai Kabushiki Kaisha
 patents
silverMedal2 out of 746 
 
Nuflare Technology, Inc.
 patents

Years Active: 2003-2014

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10 patents (USPTO):Explore Patents
1. 8847178 - Charged particle beam writing apparatus and charged particle beam writing method (2014-09-30),
2. 8237139 - Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus (2012-08-07),
3. 7029214 - Linear guide apparatus (2006-04-18),
4. 6895297 - Numerical control device (2005-05-17),
5. 6889115 - Position control apparatus and position control method (2005-05-03),
6. 6830415 - Chip removal method and chip removal system for NC machine tools (2004-12-14),
7. 6728595 - Numerical controller and numerical control method for NC machine tools (2004-04-27),
8. 6701212 - Lost motion correction system and lost motion correction method for numerical control machine tool (2004-03-02),
9. 6685178 - Linear guiding apparatus for machine tool (2004-02-03),
10. 6606535 - Numerical control apparatus and feed control processing method therefor (2003-08-12),

Title: Innovator Kazuhiro Shiba: A Visionary in Charged Particle Beam Technology

Introduction: Kazuhiro Shiba, based in Shizuoka-ken, Japan, is a prominent inventor known for his significant contributions to the field of charged particle beam technology. With a remarkable portfolio of 10 patents, Shiba has pioneered innovative solutions that enhance the capabilities of modern photolithography and writing apparatus.

Latest Patents: Among his latest innovations, Shiba has developed a charged particle beam writing apparatus and a corresponding method. This apparatus features a substrate cover attachment/detachment unit designed to streamline the writing process on substrates. The writing unit employs a charged particle beam to accurately inscribe patterns while a position measurement unit ensures precise alignment by correcting positional deviations before and after the writing process. Additionally, Shiba has introduced a method for detecting substrate positions in charged particle beam photolithography, utilizing a laser beam to illuminate the substrate and accurately calculate its position on a moveable stage.

Career Highlights: Throughout his career, Kazuhiro Shiba has held significant roles in esteemed companies, including Toshiba Kikai and Nuflare Technology, Inc. His expertise in engineering and innovation has made a substantial impact in the development of advanced manufacturing technologies.

Collaborations: Shiba has worked closely with several notable colleagues, including Minoru Hamamura and Takao Date. Their combined efforts have propelled advancements in the industry, contributing to the larger field of photolithography and charged particle beam applications.

Conclusion: Kazuhiro Shiba's innovative work in charged particle beam technology continues to shape the future of precision manufacturing and photolithography. His continued commitment to excellence and collaboration with other experts in the field underline his pivotal role as an inventor and leader in technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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