Toshiba Kikai Kabushiki Kaisha

Nuflare Technology, Inc.

Kazuhiro Shiba

Minoru Hamamura

Jun Fujita

Takao Date

Michihiro Kawaguchi

Sadaji Hayama

Kiminobu Akeno

Katsuhito Endo

Yoshiaki Kai

Yoshinori Kagawa

Keisuke Yamaguchi

Yoshiro Yamanaka

Kota Fujiwara

A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.

Charged particle beam writing apparatus and charged particle beam writing method

One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.

Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus

There is provided a linear guide apparatus which, owing to the use of a gap-free braking device in a rolling guide, has a sufficiently high damping capacity. The linear guide apparatus for guiding a linear motion of a movable body along a guide rail on a fixed structure in a machine tool, includes: a rolling guide section including a rolling element for rolling on a rolling element-rolling surface of the guide rail; and a brake section for enhancing the damping capacity of the rolling guide section, the brake section including a pair of brake shoes, having a flexible structure, for sliding on the rolling element-rolling surface of the guide rail.

Linear guide apparatus

A numerical control device is disclosed having a parameter memory sectionB that stores discrete optimum parameters for respective operational modes, an operational mode setting switchto allow operational modes to be selectively set through user's operation, and a defect content setting means for registering defect contents of machined results. The optimum parameter, suited for a particular operational mode selected and set with the operational mode setting switch, is retrieved for executing setting of the parameter while enabling setting of the parameter based on information obtained with the defect content setting means.

Numerical control device

A position control apparatus and method has been devised which provides for an improved means of suppressing tracking error from a variable position reference occurring when a control object positioned via a transmission mechanism with mechanical transmission error resumes movement from a state stopped at a target position. A selection between two alternative tracking error compensating means within the control apparatus is made based on whether the detected position of the control object changes in a period after the control object stops and before the variable position reference is input again to a control deviation generating unit.

Position control apparatus and position control method

A portion ( ) of a chip remover ( ) is defined to be vibratory to give an NC machine tool (MT ) a vibration transferable onto a surface (FS) of a work ( ) under a finishing by the NC machine tool (MT ), a decision is made whether the NC machine tool (MT ) enters the finishing, and vibration of the vibratory portion ( ) is controlled, as the decision is true. A chip removal method and an NC machine tool equipped with a spiral chip remover ( ) as a chip remover have various chip removal rules for determining permission/prohibition of the operation of the spiral chip remover ( ). This spiral chip remover ( ) operates based on commands described in a machining program. When a command in the machining program is executed, the permission/prohibition of the operation of the spiral chip remover ( ) is controlled according to the chip removal rules.

Chip removal method and chip removal system for NC machine tools

A feed velocity of a control axis and acceleration thereof do not exceed a maximum feed velocity and a maximum acceleration defined in mechanical specifications even if a radial operation is carried out for the purpose of a cut-in or escape operation in a contour describing control. A radial permissible maximum velocity (Vnp) and a radial permissible maximum acceleration ( np) in a contour describing control using a circular interpolation is set separately from a setting value of a maximum feed velocity (Vm) of a control axis and that of a maximum acceleration ( m) thereof set as mechanical specifications, and when a command of the circular interpolation is given, limitations are given to a radial velocity (Vn) and acceleration ( n) so that the radial velocity (Vn) and acceleration ( n) do not exceed the radial permissible maximum velocity (Vnp) and permissible maximum acceleration ( np).

Numerical controller and numerical control method for NC machine tools

A lost motion correction value setting method for a machine tool of a hybrid control system that performs a positional loop control with both machine position signals outputted from position detecting scales for detecting machine positions and motor position signals outputted from rotary encoders for detecting a rotational angle of a feed driving servomotor includes executing a test program; periodically inputting the machine position signals outputted from the position detecting scale and the motor position signals outputted from the rotary encoder; determining errors by determining the difference between the machine position signals and the motor position signals, determining the difference between an average value on an advance side and an average value on a return side of the errors, and storing the difference in lost motion correction value memories as a dynamic lost motion correction value.

Lost motion correction system and lost motion correction method for numerical control machine tool

There is provided a linear guiding apparatus for a machine tool, the system having both of rapid characteristics of a rolling guide which does not deteriorate the precision of movement, and damping characteristics of a sliding guide which is hardly influenced by the load of a movable body. The feed guiding system includes: rolling guides and for guiding a horizontal movement while receiving the load of a movable body on a bed ; a sliding guide including sliding guide ways and , which extend in parallel to the rolling guides and in vertical directions, and slider portions and which slide on the sliding guide ways; and frictional force setting parts for changing the frictional force between the slider portions and the sliding guide ways, to set the magnitude of the frictional force.

Linear guiding apparatus for machine tool

A machining program is read in and interpreted and a determination is made as to whether the amount of movement called for by a block of commands is larger or smaller than a minimum amount of movement that is established by a feed speed and a one sampling period of a numerical control apparatus. If the amount of movement called for is greater than the minimum amount of movement, feed control is performed in accordance with the current block. If the amount of movement called for by the current block of commands is smaller than the minimum movement amount, an immediate subsequent block of commands is concatenated with the current block, and this concatenation of command blocks is continued until a synthesized block calling for an amount of movement greater than the minimum amount of movement is obtained, this synthesized block then being used to perform feed control.

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Shizuoka-ken, Japan

Kazuhiro Shiba