Matsumoto-city, Japan

Kazuhiro Kitahara

This inventor holds 2 USPTO granted patents. Top assignee: Fuji Electric., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kazuhiro Kitahara. Retrieved from https://idiyas.com/inventor/kazuhiro-kitahara-moq7vsr7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0


Company Filing History:


Years Active: 2026

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Kazuhiro Kitahara: Semiconductor Manufacturing Inventor.

Introduction

Kazuhiro Kitahara is an inventor associated with Matsumoto-city, Japan, and Fuji Electric Co., Ltd. His patent work concerns methods for manufacturing semiconductor devices.

Latest Patents

Kitahara is credited with 1 patent, titled “Method of Manufacturing Semiconductor Device.” The invention describes forming a MOS surface structure on a semiconductor substrate, partially covering it with an interlayer insulating film, and applying an aluminum alloy film over the structure. A resist film is then formed with a thickness that partially exposes a convex-shaped defect in the alloy film. The alloy is patterned using the resist as a mask, after which the resist is removed.

Career Highlights

The available information connects Kitahara’s inventive work with Fuji Electric Co., Ltd. His patent focuses on a semiconductor manufacturing process involving surface structures, aluminum alloy films, and resist patterning.

Collaborations

Kitahara’s listed coworkers include Noriaki Noji and Naoko Kodama.

Conclusion

Kazuhiro Kitahara’s recorded patent reflects his contribution to semiconductor device manufacturing through a process designed to address a convex-shaped defect in an aluminum alloy film.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…