Company Filing History:
Years Active: 2015-2017
Title: The Innovative Mind of Kazuhiko Koumura
Introduction
Kazuhiko Koumura, based in Tokyo, Japan, is a prominent inventor known for his significant contributions to the field of technology. With a total of two patents to his name, Koumura has demonstrated his expertise in the realm of pattern-forming methods and resist underlayer film-forming compositions.
Latest Patents
Koumura's latest patents focus on advanced techniques that enhance the efficiency of substrate processing. His first patent describes a pattern-forming method that involves providing a resist underlayer film on a substrate using a specialized resist underlayer film-forming composition. This composition includes a first polymer with a glass transition temperature ranging from 0 to 180°C. Furthermore, his methodology incorporates the deposition of a silicon-based oxide film on the resist underlayer film's surface. Through a series of precise steps, including dry-etching processes, Koumura's invention aims to improve the accuracy and effectiveness of pattern formation in various applications.
His second patent elaborates on a resin composition designed for forming a resist underlayer film. This composition features a resin that contains aromatic rings and a crosslinking agent with specific structural properties. The innovation addresses the need for enhanced material performance in patterning technologies, which are critical in various industrial applications.
Career Highlights
Koumura's tenure at JSR Corporation has been marked by his commitment to innovation and quality. As an expert in his field, his work has greatly contributed to JSR's reputation as a leading company in the development of advanced materials. His patents reflect a deep understanding of both theoretical and practical aspects of chemical engineering and materials science.
Collaborations
Throughout his career, Koumura has collaborated with talented colleagues, including Shinya Minegishi and Takashi Mori. These partnerships have fostered an environment of creativity and collaboration, allowing for the exchange of ideas and the development of cutting-edge technologies.
Conclusion
Kazuhiko Koumura stands out as a notable inventor whose work continues to impact the field of technology positively. His innovative patents in pattern-forming methods and resist underlayer film-forming compositions illustrate his dedication to advancing industry standards. As he continues to work at JSR Corporation, Koumura remains a key figure in driving innovation forward in the realm of material sciences.