Yamanashi, Japan

Kazuhide Hasebe

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1995-2025

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3 patents (USPTO):

Title: Kazuhide Hasebe: Innovator in Film Deposition Technology

Introduction

Kazuhide Hasebe, an accomplished inventor based in Yamanashi, Japan, has made significant contributions to the field of semiconductor manufacturing, particularly in the area of film deposition technology. With a total of three patents to his name, Hasebe's work has advanced the methods used for fine pattern formation in electronic devices, making an impact in the technology landscape.

Latest Patents

Hasebe's most notable patents focus on a film deposition apparatus designed for fine pattern forming. In his innovative mask pattern forming method, a resist film is created over a thin film substrate. This resist film undergoes photolithography to form resist patterns with a specified pitch. After processing, slimming of the resist patterns is conducted, followed by the formation of an oxide film on both the thin film and the resist patterns. This is achieved within a film deposition apparatus that continuously supplies a source gas along with either an oxygen radical or an oxygen-containing gas. The unique aspect of his latest patents is the integration of slimming and oxide film forming processes, ensuring efficiency and precision in manufacturing.

Career Highlights

Throughout his career, Kazuhide Hasebe has been associated with prestigious companies such as Tokyo Electron Limited and Tokyo Electron Kabushiki Kaisha. His expertise in semiconductor technologies has allowed him to develop advanced manufacturing techniques that are critical to the production of modern electronic components.

Collaborations

Hasebe has worked alongside esteemed colleagues including Shigeru Nakajima and Jun Ogawa. Their collaborations have contributed to various developments and advancements in the semiconductor industry, showcasing the importance of teamwork in pioneering technology.

Conclusion

Kazuhide Hasebe's contributions to the field of film deposition technology represent significant innovations in the semiconductor industry. With his patents facilitating more efficient manufacturing processes, Hasebe continues to shape the future of technology in Japan and beyond. His innovative spirit and collaborative efforts exemplify the importance of continuous advancement in engineering and technology.

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