Ibaraki, Japan

Kazuhide Fukaya

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.7

ph-index = 1


Company Filing History:


Years Active: 2017-2023

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4 patents (USPTO):Explore Patents

Title: Kazuhide Fukaya: Innovator in Semiconductor Technology

Introduction

Kazuhide Fukaya is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on innovative methods and devices that enhance the efficiency and functionality of semiconductor manufacturing.

Latest Patents

Fukaya's latest patents include a semiconductor device and a method of manufacturing the same. This invention features an interlayer insulating film with via holes. A sidewall conductive layer is arranged along the sidewall surface of one via hole and contains materials such as tungsten, titanium, titanium nitride, tantalum, and molybdenum. Additionally, a second metal wiring layer is embedded in one via hole and contains aluminum, while a plug layer is embedded in the other via hole, also containing materials from the aforementioned group. Another notable patent involves methods for manufacturing semiconductor devices and detecting the endpoint of dry etching. This method accurately forms a via hole in an interlayer insulating film over a metal wiring. The emission spectra of plasma used for dry etching are monitored to detect the endpoint based on the emission intensities of CO, CN, and AlF.

Career Highlights

Kazuhide Fukaya is currently employed at Renesas Electronics Corporation, where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Fukaya has collaborated with notable coworkers, including Toshikazu Hanawa and Kentaro Yamada, further enhancing the impact of his work in the semiconductor field.

Conclusion

Kazuhide Fukaya's contributions to semiconductor technology through his patents and work at Renesas Electronics Corporation highlight his role as an influential inventor. His innovative approaches continue to shape the future of semiconductor manufacturing.

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