Katsuyuki Ikenouchi

Title: Innovations of Katsuyuki Ikenouchi

Introduction

Katsuyuki Ikenouchi is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving semiconductor substrates and manufacturing processes.

Latest Patents

Ikenouchi's latest patents include a semiconductor substrate and a method for fabricating the same. This innovation features a semiconductor substrate with a notch in its edge portion, where each shoulder of the notch is designed as an arc. The curvature difference between the two shoulder portions is maintained between 0 mm and 0.1 mm. Another significant patent is a substrate polishing method that can be utilized in a polishing apparatus with multiple carriers. This method determines the necessary polishing time to achieve a specific amount of polishing using only some of the carriers. A correction coefficient is established to correlate the polishing times, allowing for precise control over the polishing process.

Career Highlights

Katsuyuki Ikenouchi is currently employed at Matsushita Electric Industrial Co., Ltd. His work at this esteemed company has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Ikenouchi has collaborated with notable coworkers, including Yoshiharu Hidaka and Yasunori Fukui. Their combined expertise has contributed to advancements in their field.

Conclusion

Katsuyuki Ikenouchi's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively.