Hamura, Japan

Katsuyuki Asaka

This inventor holds 1 USPTO granted patent. Top assignee: Renesas Technology Corp.. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuyuki Asaka. Retrieved from https://idiyas.com/inventor/katsuyuki-asaka-0v56a76n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Katsuyuki Asaka: Innovator in Semiconductor Technology

Introduction

Katsuyuki Asaka is a prominent inventor based in Hamura, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of integrated circuit devices. His innovative approaches have led to advancements that enhance the performance and reliability of semiconductor devices.

Latest Patents

Katsuyuki Asaka holds a patent for a method of manufacturing semiconductor integrated circuit devices. The patent, titled "Method of manufacturing semiconductor integrated circuit device, and semiconductor integrated circuit device made by its method," focuses on suppressing the mutual diffusion of impurities in a gate electrode. This is particularly important near the boundary between n-channel and p-channel type MISFETs, which utilize a polycide's dual-gate structure. By preventing the mutual diffusion of impurities through specific heat treatment protocols, Asaka's method improves the integrity of the semiconductor devices.

Career Highlights

Asaka is associated with Renesas Technology Corporation, where he applies his expertise in semiconductor manufacturing. His work has been instrumental in developing technologies that push the boundaries of what is possible in integrated circuits. With a focus on innovation, he continues to contribute to the advancement of semiconductor technology.

Collaborations

Katsuyuki Asaka has collaborated with notable colleagues, including Masatoshi Hasegawa and Satoshi Sakai. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Katsuyuki Asaka's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patent and work at Renesas Technology Corporation highlight his commitment to advancing integrated circuit manufacturing. Asaka's achievements continue to influence the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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