Company Filing History:
1 out of 115 
1 out of 1 Years Active: 2011-2013
Title: Innovations of Katsutoshi Kuramoto
Introduction
Katsutoshi Kuramoto is a notable inventor based in Kawaguchi, Japan. He has made significant contributions to the field of materials science, particularly in the development of compositions for antireflective films. With a total of 2 patents, his work has implications for various applications in photolithography and semiconductor manufacturing.
Latest Patents
Kuramoto's latest patents include a composition for the formation of a top antireflective film and a pattern formation method using this composition. The first patent discloses a composition that comprises at least one fluorine-containing compound and a quaternary ammonium compound. This composition can achieve the same functional levels as conventional top antireflective film-forming compositions while being applied in smaller amounts. The second patent provides a composition for forming a top anti-reflection coating with a low refractive index, suitable for pattern formation using an ArF excimer laser beam. This composition includes a specific naphthalene compound, a polymer, and a solvent, enabling effective pattern formation from a photoresist layer.
Career Highlights
Throughout his career, Kuramoto has worked with prominent companies in the electronic materials sector, including Az Electronic Materials USA Corp. and Electronic Materials USA Corp. His expertise in materials science has allowed him to contribute to advancements in the industry.
Collaborations
Kuramoto has collaborated with notable professionals in his field, including Yasushi Akiyama and Masakazu Kobayashi. These collaborations have further enriched his research and development efforts.
Conclusion
Katsutoshi Kuramoto's innovative work in the development of antireflective film compositions showcases his significant impact on materials science. His contributions continue to influence advancements in photolithography and semiconductor technologies.