The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2011
Filed:
Dec. 21, 2007
Katsutoshi Kuramoto, Kawaguchi, JP;
Masakazu Kobayashi, Kakegawa, JP;
Yasushi Akiyama, Kakegawa, JP;
Katsutoshi Kuramoto, Kawaguchi, JP;
Masakazu Kobayashi, Kakegawa, JP;
Yasushi Akiyama, Kakegawa, JP;
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating composition comprises a particular naphthalene compound, a polymer, and a solvent. The composition is used for forming a top anti-reflection coating provided on a photoresist layer. From the photoresist layer, a pattern can be formed by use of light in 160 to 260 nm.