Location History:
- Chuo, JP (1986)
- Yokohama, JP (1981 - 1999)
Company Filing History:
2 out of 377 
2 out of 266 
1 out of 574 
Years Active: 1981-1999
Title: Katsutoshi Igarashi: Innovator in Radiation Sensitive Resin Technology
Introduction
Katsutoshi Igarashi is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of materials science, particularly in the development of radiation sensitive resin compositions. With a total of 8 patents to his name, Igarashi's work has had a substantial impact on various industries.
Latest Patents
Igarashi's latest patents include a radiation sensitive resin composition and a liquid curable urethane (meth)acrylate containing resin composition. The radiation sensitive resin composition is designed to provide high reliability and excellent curing characteristics. The liquid curable resin composition contains a urethane bond at a concentration of 2.0.times.10.sup.-3 mole/gm or more. It comprises a urethane (meth)acrylate with at least three cyclic structures, a polymerizable mono-functional vinyl monomer with a glass transition point of 50.degree. C. or more, and a polymerization initiator. This innovative composition exhibits a high Young's modulus, minimal contraction stress, and high tenacity, making it suitable for use as a coating material for optical fibers and protective coatings for various materials.
Career Highlights
Throughout his career, Igarashi has worked with notable companies such as Japan Synthetic Rubber Co., Ltd. and Desoto, Inc. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to advancements in the field.
Collaborations
Igarashi has collaborated with esteemed colleagues, including Tohru Ohtaka and Timothy Edward Bishop. These partnerships have fostered innovation and the exchange of ideas, further enhancing the quality of his work.
Conclusion
Katsutoshi Igarashi is a distinguished inventor whose contributions to radiation sensitive resin technology have made a lasting impact. His innovative patents and collaborations reflect his commitment to advancing materials science.