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For the Inventor, By the Inventor

Tokyo, Japan

Orc Manufacturing Co., Ltd.

Calculating rank
USPTO Granted Patents = 80

% Expired Patents = 13.8


Trademarks = 8

Forward Citations = 365

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76 inventors (with patents filed for the assignee):

goldMedal Takashi Okuyama (10 out of 14 patents)

silverMedal Minoru Watanuki (9 out of 9 patents)

bronzeMedal Yoshio Yazaki (8 out of 13 patents)

4.  Duk Lee (6 out of 6 patents)

5.  Akira Morita (5 out of 27 patents)

6.  Izumi Serizawa (5 out of 7 patents)

7.  Jin Sato (4 out of 42 patents)

8.  Akira Nakazawa (4 out of 54 patents)

9.  Akiyoshi Fujimori (4 out of 4 patents)

10.  Go Kobayashi (3 out of 3 patents)

11.  Yasuhiko Okugi (3 out of 3 patents)

12.  Nobuo Adachi (3 out of 3 patents)

13.  Takehiko Okamura (3 out of 3 patents)

14.  Masahiro Kurano (3 out of 3 patents)

15.  Hiroshi Miyamoto (3 out of 4 patents)


Core Competencies:
Excimer Lamp
UV Irradiation Unit
Photolithography System
Projection Aligner
Transfer Device
High Pressure Discharge Lamp
Alignment Mechanism
Exposure Method
Curing Apparatus
Film Thickness Measuring Apparatus
Laser Device
Optical Projection System

80 patents:

1. 12424431 - Excimer lamp and UV irradiation unit including the same (2025-09-23),
2. 12183568 - Excimer lamp and UV irradiation unit including the same (2024-12-31),
3. 9280062 - Exposure device (2016-03-08),
4. 9013695 - Projection aligner (2015-04-21),
5. 8599357 - Photolithography system (2013-12-03),
6. 8319946 - Transfer device (2012-11-27),
7. 8253332 - Excimer lamp (2012-08-28),
8. 8164265 - Lighting method of microwave excitation discharge lamp (2012-04-24),
9. 8023105 - Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns (2011-09-20),
10. 7979153 - Exposure data generating apparatus (2011-07-12),
11. 7969553 - Exposure device with mechanism for forming alignment marks and exposure process conducted by the same (2011-06-28),
12. 7961299 - Transfer device (2011-06-14),
13. 7924407 - Exposure device (2011-04-12),
14. 7767983 - Exposure device (2010-08-03),
15. 7741622 - Exposure device (2010-06-22),
Company Overview
Orc Manufacturing Co., Ltd., based in Tokyo, specializes in advanced photolithography systems essential for semiconductor manufacturing. The company focuses on developing cutting-edge technologies such as excimer lamps and UV irradiation units, which are critical for precise patterning in microfabrication processes. Their expertise extends to projection aligners and transfer devices, ensuring high accuracy and efficiency in alignment mechanisms and exposure methods. Orc Manufacturing plays a vital role in supporting the semiconductor industry's evolving needs.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 27 2026

80 Patents

#630 in Tokyo

#1,308 in Japan

#9,466 in the World

Tokyo, JP
Tokyo, Japan

Orc Manufacturing Co., Ltd.

Forward Citations = 365

76 inventors:

goldMedal Takashi Okuyama (10 out of 14 patents)

silverMedal Minoru Watanuki (9 out of 9 patents)

bronzeMedal Yoshio Yazaki (8 out of 13 patents)

4.  Duk Lee (6 out of 6 patents)

5.  Akira Morita (5 out of 27 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Orc Manufacturing Co., Ltd.. Retrieved from https://idiyas.com/company/orc-manufacturing-company

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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