The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2013
Filed:
Aug. 04, 2008
Takashi Okuyama, Saitama, JP;
Yoshinori Kobayashi, Tokyo, JP;
Takashi Okuyama, Saitama, JP;
Yoshinori Kobayashi, Tokyo, JP;
Orc Manufacturing Co., Ltd., Tokyo, JP;
Abstract
A photolithography system has at least one spatial light modulator, a scanning mechanism configured to move an exposure area relative to a target object in a scanning direction, a plurality of memories (1to Nmemories), a data processor, and exposure controller. The exposure area is defined as a projection area of the spatial light modulator. The plurality of memories corresponds to a plurality of partial exposure areas that is defined by dividing the exposure area. The data processor successively writes exposure data into each memory in accordance with the timing of an exposure, and the exposure controller controls the plurality of light modulating elements on the basis of the relative position of the exposure area. The data processor writes newly generated exposure data into the first memory, and shifts exposure data stored in the 1to (N−1)memories to the 2to Nmemories, respectively.