Hitachi, Japan

Katsushige Tsukada


Average Co-Inventor Count = 4.3

ph-index = 8

Forward Citations = 197(Granted Patents)


Location History:

  • Hitachi, JA (1976 - 1977)
  • Hitachi, JP (1978 - 1990)

Company Filing History:


Years Active: 1976-1990

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10 patents (USPTO):Explore Patents

Title: The Innovations of Katsushige Tsukada: A Pioneer in Photosensitive Resin Technology

Introduction

Katsushige Tsukada, an inventive spirit from Hitachi, Japan, has made significant contributions to the field of materials science with a focus on photosensitive resin compositions. With a remarkable portfolio of 10 patents, his work stands out for its innovative approaches to enhancing the functionality and performance of materials used in printed wiring boards.

Latest Patents

Among his latest inventions are two notable patents that showcase his expertise and creativity in developing advanced materials. The first patent describes a photosensitive resin composition solution specifically designed for forming a permanent mask on substrates using curtain flow or roll coating methods. This solution comprises an oligomer with epoxy and polymerizable vinyl groups, a photopolymerization initiator, an epoxy resin curing agent, a filler, and a solvent. The formula emphasizes a unique solvent blend that enhances the rheological properties of the solution, facilitating a viscosity of between 100 and 200 mPas at 25 degrees Celsius.

In his second patent, Tsukada developed a photosensitive resin composition that includes a urethane diacrylate or dimethacrylate compound, linear polymeric compounds, and specific sensitizers. This composition excels in heat resistance, thermal shock resistance, and solvent resistance, making it ideal for soldering masks. The protective coating film created from this resin not only meets but exceeds industry standards for durability in electronic applications.

Career Highlights

Throughout his career, Katsushige Tsukada has been associated with some of the leading companies in the materials industry, including Hitachi Chemical Company and Ibiden Company Limited. His roles at these esteemed organizations have enabled him to apply his innovative ideas and research findings in practical applications that benefit a wide range of industries.

Collaborations

In addition to his personal achievements, Tsukada has worked alongside esteemed colleagues, including Nobuyuki Hayashi and Toshiaki Ishimaru. These collaborations have further enriched his work, contributing to advancements in photosensitive materials and fostering a culture of innovation within his teams.

Conclusion

Katsushige Tsukada's innovative contributions to photosensitive resin technology reflect a deep understanding of materials science and an unwavering commitment to improving industry standards. His patents not only showcase his technical expertise but also his vision for future advancements in the field, making him a notable figure among contemporary inventors. As the demand for high-performance materials continues to evolve, Tsukada's work remains at the forefront of innovation.

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