The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 1977
Filed:
Jul. 10, 1975
Nobuyuki Hayashi, Hitachi, JA;
Asao Isobe, Hitachi, JA;
Katsushige Tsukada, Hitachi, JA;
Ken Ogawa, Hitachi, JA;
Masahiro Abo, Hitachi, JA;
Abstract
A resist image, which is excellent in adhesiveness and high in physicochemical strengths, can be obtained by using as a resist material a resin composition having such properties that when it is exposed to actinic rays, a latent image (cure-precursor) is formed therein, and when it is subjected to subsequent heating, only the latent image portion is selectively cured. An example of the above-mentioned resin composition is a latently curable epoxy resin composition composed essentially of (A) an epoxy resin prepolymer and (B) a compound having in the molecule at least two groups represented by the formulas (I) and/or (II), ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 are individually a hydrogen atom, an alkyl group or aryl group. Another example of the resin composition is a curable resin composition composed mainly of photopolymerization sensitizers and N-methylolacrylamide derivatives represented by the formula, ##STR2## wherein R is a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms; and R' is a hydrogen atom or a methyl group.