Katsuo Komuro

Title: Katsuo Komuro: Innovator in Particle Beam Lithography

Introduction

Katsuo Komuro is a notable inventor based in Ichikawa, Japan. He has made significant contributions to the field of particle beam lithography, holding a total of 3 patents. His work focuses on enhancing the precision and effectiveness of lithographic techniques.

Latest Patents

Katsuo Komuro's latest patents include innovative designs and methods that improve particle beam lithography. One of his patents, titled "Stencil, stencil design system and method for cell projection particle beam lithography," discloses stencil masks and methods that allow for more accurate image writing. This is achieved by reducing various chemical and physical effects, particularly Coulomb and proximity effects. The introduction of shield areas helps preserve the shape and fidelity of the written image. Additionally, he has developed a method and system for proximity effect and dose correction for a particle beam writing device. This method involves selecting at least two cell patterns from a stencil, correcting proximity effects through dose control, and writing the patterns in a single shot after correction.

Career Highlights

Throughout his career, Katsuo Komuro has worked with prominent companies in the technology sector. He has been associated with Cadence Design Systems, Inc. and D2s, Inc., where he has contributed to advancements in design and lithography technologies.

Collaborations

Katsuo has collaborated with notable professionals in his field, including Takashi Mitsuhashi and Akira Fujimura. These collaborations have further enriched his work and innovations in particle beam lithography.

Conclusion

Katsuo Komuro's contributions to particle beam lithography demonstrate his commitment to innovation and precision in technology. His patents reflect a deep understanding of the complexities involved in lithographic processes, making him a significant figure in the field.