Miyagi, Japan

Katsunori Hirai

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015-2021

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3 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Inventor Katsunori Hirai

Introduction: Katsunori Hirai, an inventive engineer based in Miyagi, Japan, has made significant contributions to the field of plasma processing technology. With three patents to his name, his work is instrumental in advancing the techniques and methods used in the semiconductor industry.

Latest Patents: Among his latest innovations are two notable patents. The first is the "Dechuck Control Method and Plasma Processing Apparatus," which outlines an innovative technique for dechucking a processed object that has been electrostatically attracted to an electrostatic chuck. This method involves lifting the processed object using a supportive mechanism while a specific voltage is applied to the electrostatic chuck's electrode. The efficiency and effectiveness of processing are enhanced with this control method.

The second patent is focused on an "Electrostatic Attraction Method." This method details a four-step process for preparing a chamber for processing a target object. The steps include introducing a gas into the chamber before placing the processing target object, generating plasma through high-frequency power application, manipulating DC voltage polarities, and carefully managing plasma extinguishment to ensure optimal attraction of the processing target object.

Career Highlights: Katsunori Hirai is currently affiliated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this prestigious organization showcases his commitment to pushing the boundaries of innovation in his field.

Collaborations: Throughout his career, Hirai has collaborated closely with notable coworkers, including Yasuharu Sasaki and Junichi Sasaki. Their combined expertise and teamwork have contributed to the successful development of advanced technologies in plasma processing and related fields.

Conclusion: Katsunori Hirai's contributions to the world of technology, especially in the realm of plasma processing, reflect his dedication as an inventor. His latest patents not only demonstrate his innovative spirit but also pave the way for more efficient practices within the semiconductor industry. As technology continues to evolve, the impact of Hirai's work will likely be felt for years to come.

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