Hamamatsu, Japan

Katsumi Shibayama

This inventor holds 264 USPTO granted patents and 23 published patent applications and 59 EPO patents, primarily in Optical Devices (CPC class G01J3-26). Top assignee: Hamamatsu-Photonics K.k.. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsumi Shibayama. Retrieved from https://idiyas.com/inventor/katsumi-shibayama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 264 

% Patents Active = 89.8

 

Average Co-Inventor Count = 3.0

ph-index = 27

Forward Citations = 1,885(Granted Patents)

Forward Citations (Not Self Cited) = 1,120(Dec 10, 2025)


Inventors with similar research interests:

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Company Filing History:


Years Active: 2004-2026

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Areas of Expertise:
Optical Unit
Light Detection Device
Optical Filter
Semiconductor Photo Detection
Mirror Unit
Inspection Method
Interconnect Structure
Fabry-Perot Filter
Optical Module
Suction Method
Electrical Inspection
Transportation Method
264 patents (USPTO):Explore Patents

Title: Katsumi Shibayama: Innovator in Semiconductor Technology

Introduction:

In the realm of semiconductor technology, Katsumi Shibayama stands as a pioneering force with his numerous patents and groundbreaking inventions. With a keen eye for innovation and a passion for pushing the boundaries of possibility, Shibayama has made notable contributions to the field. This article explores his latest patents, highlights his prominent career, and sheds light on his collaborations with fellow innovators.

Latest Patents:

Shibayama's latest patents demonstrate his expertise in the manufacturing and design of semiconductor photo detection elements. One such patent is the "Method for manufacturing back surface incident type semiconductor photo detection element," which focuses on a semiconductor substrate. This substrate includes planned regions where second semiconductor regions forming pn junctions are formed, along with a textured region on these planned surfaces. These elements pave the way for enhanced semiconductor light detection capabilities and improved efficiency.

Another noteworthy patent is the "Semiconductor light detection element" which introduces a carbon nanotube film. This film is deposited with numerous carbon nanotubes, extending over the upper surface of the light reception region and the metal portion on the front surface of the semiconductor. This innovation contributes to higher sensitivity and improved performance of semiconductor light detection, opening up new possibilities in the field.

Career Highlights:

Shibayama's exceptional career is marked by remarkable achievements and advancements in semiconductor technology. Working at Hamamatsu Photonics K.K., a leading organization in the industry, Shibayama has helped propel the company to new heights with his invaluable contributions. Through relentless experimentation and dedication to excellence, he has successfully obtained an impressive total of 155 patents.

Collaborations:

Collaboration is often the catalyst for groundbreaking innovations, and Shibayama has had the privilege of working alongside notable industry professionals. Two such individuals include Takafumi Yokino and Masaki Hirose, esteemed inventors and colleagues. Together, they have pushed the boundaries of semiconductor technology and have collectively contributed to the advancement of their field.

Conclusion:

Katsumi Shibayama has left an indelible mark on the world of semiconductor technology through his prolific patents and inventive spirit. His pioneering work in the manufacturing and design of semiconductor photo detection elements has revolutionized the industry, making significant strides towards improved performance and efficiency. With a flourishing career and fruitful collaborations, Shibayama continues to shape the future of this rapidly evolving field. We eagerly anticipate his future contributions and the impact they will have on the world of innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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