Tokyo, Japan

Katsuhiko Tomisaka

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: Resonac Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuhiko Tomisaka. Retrieved from https://idiyas.com/inventor/katsuhiko-tomisaka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Katsuhiko Tomisaka

Introduction

Katsuhiko Tomisaka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor device production. His innovative work has led to the development of a unique adhesive sheet and its production method.

Latest Patents

Katsuhiko Tomisaka holds a patent for an "Adhesive sheet, production method for adhesive sheet, roll, and production method for connection structure." This patent outlines a production method for an adhesive sheet specifically designed for semiconductor device production. The method includes preparing a backing material-attached laminated body, a laminated body cutting step, and a backing material peeling step. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing.

Career Highlights

Katsuhiko Tomisaka is currently employed at Resonac Corporation, where he continues to push the boundaries of innovation in his field. His work has garnered attention for its practical applications in technology and manufacturing.

Collaborations

Some of his coworkers include Kenta Kikuchi and Hiroyuki Izawa, who contribute to the collaborative environment at Resonac Corporation.

Conclusion

Katsuhiko Tomisaka's contributions to the field of semiconductor device production through his innovative adhesive sheet patent exemplify the importance of creativity in technology. His work continues to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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