Katsuhiko Anbai

Title: Katsuhiko Anbai: Innovator in Semiconductor Processing

Introduction

Katsuhiko Anbai is a prominent inventor based in Oshu, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on improving examination methods and reducing contamination in semiconductor manufacturing.

Latest Patents

Anbai's latest patents include an examination method and examination assistant device for quartz products used in semiconductor processing apparatus. This device is designed to analyze metal impurities in quartz pole members by holding a process solution in contact with the examination objective portion. The device features a pair of end plates that engage with concave portions of the pole member, along with a solution receiver that stores the process solution.

Another notable patent is related to a baking method of quartz products, which aims to control copper contamination in semiconductor substrates. This invention involves using baking gases, including hydrogen chloride and oxygen, to reduce copper concentration in quartz products to below 20 ppb, and preferably below 3 ppb. This process can be performed before or after the quartz product is assembled into the heat treatment apparatus.

Career Highlights

Katsuhiko Anbai is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His innovative work has contributed to advancements in semiconductor processing technologies.

Collaborations

Anbai has collaborated with notable coworkers, including Masayuki Oikawa and Masato Kadobe, who have also contributed to the field of semiconductor technology.

Conclusion

Katsuhiko Anbai's contributions to semiconductor processing through his innovative patents demonstrate his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry and improve manufacturing processes.