The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Sep. 06, 2004
Masayuki Oikawa, Mizusawa, JP;
Katsuhiko Anbai, Esashi, JP;
Nobuhiro Takahashi, Kai, JP;
Teruyuki Hayashi, Kofu, JP;
Masayuki Oikawa, Mizusawa, JP;
Katsuhiko Anbai, Esashi, JP;
Nobuhiro Takahashi, Kai, JP;
Teruyuki Hayashi, Kofu, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An examination assistant device () is used for examination in which a process solution containing an etching solution is held in contact with an examination objective portion of a quartz pole member () of a semiconductor processing apparatus, and then the process solution is analyzed to identify a metal impurity contained in the examination objective portion. The pole member () includes a pair of concave portions () disposed one on either side of the examination objective portion. The examination assistant device () includes a pair of end plates () configured to engage with the pair of concave portions, a frame () connecting the pair of end plates, and a solution receiver () disposed between the pair of end plates. The solution receiver () has dimensions to store the process solution and hold the process solution in contact with the examination objective portion.