Kudamatsu, Japan

Katsuaki Nagatomo


Average Co-Inventor Count = 5.7

ph-index = 5

Forward Citations = 142(Granted Patents)


Company Filing History:


Years Active: 1981-1987

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6 patents (USPTO):Explore Patents

Title: Katsuaki Nagatomo: Innovator in Plasma Technology

Introduction

Katsuaki Nagatomo is a prominent inventor based in Kudamatsu, Japan. He has made significant contributions to the field of plasma technology, holding a total of 6 patents. His work focuses on methods and apparatuses that enhance the efficiency and uniformity of plasma treatments.

Latest Patents

Nagatomo's latest patents include a plasma treating method and an apparatus designed for this purpose. The plasma treating method involves monitoring the energies of plasmas corresponding to multiple samples. It also includes steps to equalize these energies based on monitored values, allowing for simultaneous treatment of samples with uniform plasma energies. The apparatus features multiple sample electrodes and a power supply that adjusts electric power independently for each electrode, ensuring consistent treatment across all samples. Another notable invention is a plasma processor that includes a processing chamber, pressure reduction means, and mechanisms to generate both electric and magnetic fields. This design allows for miniaturization of the processor while maintaining uniform processing of samples.

Career Highlights

Katsuaki Nagatomo is associated with Hitachi, Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing the capabilities of plasma processing, making it more efficient and effective for various applications.

Collaborations

Nagatomo has collaborated with notable colleagues such as Fumio Shibata and Kiyoshi Fujiwara. Their combined expertise has contributed to the development of advanced plasma technologies.

Conclusion

Katsuaki Nagatomo's contributions to plasma technology through his innovative patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in plasma processing techniques.

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