The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 1986
Filed:
Sep. 19, 1985
Norio Nakazato, Kudamatsu, JP;
Yutaka Kakehi, Hikari, JP;
Takeshi Harada, Chiyoda, JP;
Ryoji Fukuyama, Kudamatsu, JP;
Makoto Nawata, Kudamatsu, JP;
Hironobu Ueda, Hitachi, JP;
Yutaka Omoto, Kudamatsu, JP;
Katsuaki Nagatomo, Kudamatsu, JP;
Fumio Shibata, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The present invention relates to a plasma processor, and the plasma processor comprises a processing chamber, means to reduce a pressure in the processing chamber so as to evacuate the interior thereof, means to introduce a processing gas into the processing chamber, means to generate an electric field within the processing chamber, and means to establish a magnetic field orthogonal to the electric field, this means being rotatable relative to a surface to-be-processed of a sample which is processed in a plasma arising under the action of the electric field and the magnetic field, whereby a space required for the movement of the means to establish the magnetic field orthogonal to the electric field can be reduced to miniaturize the processor, and the uniform processing of the sample can be attained using rotatable plasma.