Kudamatsu, Japan

Makoto Nawata

USPTO Granted Patents = 16 

Average Co-Inventor Count = 5.2

ph-index = 8

Forward Citations = 216(Granted Patents)


Company Filing History:


Years Active: 1984-2002

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16 patents (USPTO):Explore Patents

Title: Inventor Profile: Makoto Nawata

Introduction: Makoto Nawata is a prominent inventor located in Kudamatsu, Japan. With an impressive portfolio of 16 patents, Nawata has made significant contributions to the field of plasma etching technology. His innovative approaches have advanced the capabilities of etching systems, which are crucial in various industrial applications.

Latest Patents: Nawata's latest innovations include two groundbreaking patents that enhance plasma etching systems. The first patent describes a plasma etching system utilizing a ground electrode made of silicon carbide and a dielectric material that does not contain aluminum. This design prevents aluminum production from these components, which significantly reduces device damage. The system comprises a substrate electrode in a vacuum process chamber, a ground electrode, and a plasma-generating source that employs plasma to etch substrates with precision.

The second notable patent is a plasma-etching apparatus that optimizes the etching of a film on a workpiece using plasma created in an evacuated etching chamber. This apparatus achieves high etch selectivity relative to the underlying film or resist film. By adjusting the frequency of the RF bias voltage applied to the sample table, the ion energy distribution is fine-tuned, enhancing the etching process's effectiveness.

Career Highlights: Makoto Nawata is currently employed at Hitachi, Ltd., where he continues to push the boundaries of plasma processing technology. His work has not only highlighted his technical expertise but has also led to substantial advancements in the efficiency and precision of etching systems used in various electronics manufacturing processes.

Collaborations: Throughout his career, Nawata has collaborated with esteemed colleagues, including Yutaka Kakehi and Ryooji Fukuyama. These partnerships have fostered an environment of innovation and creativity, allowing them to tackle complex engineering challenges together.

Conclusion: Makoto Nawata's contributions to plasma etching technology are invaluable, evidenced by his 16 patents and ongoing research at Hitachi, Ltd. As an inventor, his work continues to influence the industry, providing essential advancements that enhance electronic manufacturing processes and ensure better product outcomes.

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