Hitachi, Ltd.

Katsuaki Nagatomo

Fumio Shibata

Kiyoshi Fujiwara

Shoji Yoshinaga

Takeshi Harada

Sadayuki Okudaira

Norio Nakazato

Yoshifumi Ogawa

Yutaka Kakehi

Makoto Nawata

Zensuke Tamura

Katsuyoshi Kudo

Hiroshi Kanekiyo

Yutaka Omoto

Ryoji Fukuyama

Gen Marumoto

Hironobu Ueda

Kyozo Yoshioka

Shoji Nomura

Hiromasa Fukumori

Hidetomo Fukuhara

Hideji Yamamoto

Katsuyasu Nishita

Shigenobu Hisatomi

Herein disclosed are a plasma treating method and an apparatus therefor. The plasma treating method comprises: the step of monitoring the energies of plasmas corresponding to the faces of a plurality of samples to be treated; the step of adjusting to equalize the energies of said plasmas on the basis of the monitored values; and the step simultaneously treating said samples with the plasmas having said equalized energies. The plasma treating apparatus comprises: a plurality of sample electrodes disposed independently of one another in positions opposed to an opposed electrode in a treating chamber evacuated to be supplied with a treating gas; power supply means for applying and adjusting electric power to said sample electrodes; and monitor means for monitoring the energies of plasmas to be generated between said opposed electrode and said sample electrodes. The electric power to be applied independently of one another from a power supply to the independently formed plural sample electrodes are adjusted such that the energies of the plasmas to be generated between the opposed electrode and the sample electrodes are equalized, whereby the energy of the plasma corresponding to the respective treated faces of the plural samples are equalized so that the uniformity of the treatment of the respective faces of the plural samples to be simultaneously treated can be improved.

Plasma treating method and apparatus therefor

The present invention relates to a plasma processor, and the plasma processor comprises a processing chamber, means to reduce a pressure in the processing chamber so as to evacuate the interior thereof, means to introduce a processing gas into the processing chamber, means to generate an electric field within the processing chamber, and means to establish a magnetic field orthogonal to the electric field, this means being rotatable relative to a surface to-be-processed of a sample which is processed in a plasma arising under the action of the electric field and the magnetic field, whereby a space required for the movement of the means to establish the magnetic field orthogonal to the electric field can be reduced to miniaturize the processor, and the uniform processing of the sample can be attained using rotatable plasma.

Plasma processor

The invention relates to a method and apparatus for a plasma process in which identical samples are processed in a plasma-processing apparatus provided with a radio-frequency plasma generation means and a microwave plasma generation means, by the utilization of a radio-frequency plasma in the radio-frequency plasma generation means and a microwave plasma in the microwave plasma generation means. The plasma-processing rate can thus be increased, and also electrical damage due to ions in the plasma can be reduced, thereby ensuring a high throughput and a high quality during the manufacture of semiconductor integrated circuit elements.

Method and apparatus for plasma process

Desalting method of fuel oil

A centrifugal type counterflow contact apparatus having a rotary body or drum intergrally mounted on a rotary shaft, and a plurality of ring members disposed within the rotary body such that circumferential slits are defined between the adjacent ring members in the axial direction of the rotary drum. The ring members have a cross sectional configuration inclined with respect to the axis of the rotary body. A light liquid is introduced into the periphery of the rotary body while a heavy liquid is introduced in the center portion of the rotary body. The heavy and light liquids flow countercurrently through the slits between the ring members under the centrifugal force produced by the rotation of the rotary body, whereby extractability can be improved and accumulation of solids entrained in the feed can be avoided.

Centrifugal type counterflow contact apparatus

A centrifugal counterflow type contactor wherein the interior space of a drum carried by a rotating shaft has a predetermined axial width or the interior space of the drum is divided by at least one baffle plate mounted on the rotating shaft into at least two chambers each having a predetermined width; and a light liquid is introduced into said interior space or each chamber at positions adjacent to the radially outward end thereof while a heavy liquid is introduced into said interior space or each chamber at positions adjacent to the radially inward end thereof so that rapid rotation of the drum causes the radial counterflow contact between the light and heavy liquids. The extraction efficiency is equal to or higher than that of a corresponding prior art centrifugal contactor, and the solids in the liquids may be prevented from being accumulated in the counterflow region.

Centrifugal counterflow type contactor

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Kudamatsu, Japan

Katsuaki Nagatomo