Company Filing History:
2 out of 13 
1 out of 20,290 
Years Active: 2002-2007
Title: Katrin Ebner: Innovator in Chemical Mechanical Polishing
Introduction
Katrin Ebner is a prominent inventor based in Dresden, Germany. She has made significant contributions to the field of chemical mechanical polishing, particularly in the development of innovative configurations and methods for enhancing the efficiency of polishing processes.
Latest Patents
Katrin Ebner holds 3 patents that showcase her expertise and innovative spirit. One of her latest patents is titled "Configuration and method for mounting a backing film to a polish head." This invention involves applying heat and pressure to a backing film with an adhesive layer while mounting it to a polish head used for chemical mechanical polishing. This method effectively removes inhomogeneities within the adhesive layer, such as thickness variations and air bubbles. The configuration includes a device for exerting a uniform pressure force, which can be a roller made of silicone or rubber, or a plate. Additionally, it features a heating device and a control unit for managing heat and pressure. This innovation allows for uniform material removal from semiconductor wafer surfaces, ultimately increasing wafer yield.
Another notable patent is the "Configuration for polishing disk-shaped objects." This invention describes a polish head for chemical mechanical polishing that incorporates a silicone backing film on a rigid support element, preferably made of amorphous ceramic. The silicone backing film is fabricated through molding, enabling a specific cross-sectional shape tailored for particular polishing needs. This design ensures uniform polishing of semiconductor wafers.
Career Highlights
Katrin has worked with several notable companies throughout her career, including Infineon Technologies and Sc300 GmbH & Co. KG, as well as Motorola Corporation. Her experience in these organizations has contributed to her expertise in the field of semiconductor processing and polishing technologies.
Collaborations
Katrin has collaborated with esteemed colleagues such as Walter Glashauser and Lutz Teichgräber. Their joint efforts have further advanced the innovations in chemical mechanical polishing.
Conclusion
Katrin Ebner is a trailblazer in the field of chemical mechanical polishing, with a focus on enhancing the efficiency and effectiveness of polishing processes. Her patents and career achievements reflect her dedication to innovation and excellence in semiconductor technology.