Company Filing History:
Years Active: 2025
Title: Kathrin Mohler: Innovator in Electron Beam Technology
Introduction
Kathrin Mohler is a prominent inventor based in Olching, Germany. He has made significant contributions to the field of electron beam technology, particularly through his innovative methods for forming multipole devices. His work has implications for various applications in semiconductor testing and materials science.
Latest Patents
Kathrin Mohler holds a patent for a "Method of forming a multipole device, method of influencing an electron beam, and multipole device." This patent describes a method for influencing an electron beam using an electron beam apparatus that includes an aperture body with at least one aperture opening. The method involves directing the electron beam onto multiple surface portions of the aperture body to create an electron beam-induced deposition pattern. This pattern is designed to function as a multipole in a charged state, specifically as a quadrupole, hexapole, or octupole. The deposition pattern can consist of carbon or carbonaceous materials, enhancing the functionality of the multipole device in electron beam applications.
Career Highlights
Kathrin Mohler is associated with Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh, where he applies his expertise in semiconductor testing technologies. His innovative approaches have positioned him as a key figure in the development of advanced electron beam apparatuses.
Collaborations
Kathrin has collaborated with notable colleagues, including John Breuer and Dominik Patrick Ehberger. Their combined efforts contribute to the advancement of technologies in the field of semiconductor testing and electron beam applications.
Conclusion
Kathrin Mohler's contributions to electron beam technology and his innovative patent highlight his role as a significant inventor in the field. His work continues to influence advancements in semiconductor testing and materials science.