Newport, United Kingdom

Katherine Crook

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Spts Technologies Limited. Active years: 2016-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katherine Crook. Retrieved from https://idiyas.com/inventor/katherine-crook

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Location History:

  • Gloucestershire, GB (2016)
  • Newport, GB (2017)

Company Filing History:


Years Active: 2016-2017

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2 patents (USPTO):Explore Patents

Title: Katherine Crook: Innovator in Plasma-Enhanced Chemical Vapor Deposition

Introduction

Katherine Crook is a notable inventor based in Newport, GB. She has made significant contributions to the field of plasma-enhanced chemical vapor deposition (PE-CVD) technology. With a total of 2 patents to her name, her work has advanced the capabilities of materials processing.

Latest Patents

Katherine's latest patents include a PE-CVD apparatus and method. This innovative apparatus features a chamber with a circumferential pumping channel, a substrate support, and multiple gas inlets for introducing gas into the chamber. It also includes a plasma production device for generating plasma within the chamber. The design incorporates an upper and lower element that define circumferential pumping gaps, optimizing the plasma confinement and gas flow.

Career Highlights

Katherine Crook has established herself as a key figure in her field through her work at SPTS Technologies Limited. Her expertise in PE-CVD technology has positioned her as a leader in the development of advanced materials.

Collaborations

Katherine has collaborated with notable colleagues such as Stephen Robert Burgess and Daniel T Archard. These partnerships have further enhanced her innovative contributions to the industry.

Conclusion

Katherine Crook's work in the field of plasma-enhanced chemical vapor deposition exemplifies her commitment to innovation and advancement in materials processing technology. Her patents reflect her expertise and dedication to her craft.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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