Lexington, KY, United States of America

Karthik Vaideeswaran


Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 36(Granted Patents)


Location History:

  • Troy, NY (US) (2008)
  • Lexington, KY (US) (2005 - 2011)

Company Filing History:


Years Active: 2005-2011

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9 patents (USPTO):Explore Patents

Title: Karthik Vaideeswaran: Innovator in Micro-Fluid Ejection Technology

Introduction

Karthik Vaideeswaran is a prominent inventor based in Lexington, KY (US). He has made significant contributions to the field of micro-fluid ejection technology, holding a total of nine patents. His innovative work has advanced the capabilities of semiconductor substrates and fluid ejection assemblies.

Latest Patents

Among his latest patents is a method for making a micro-fluid ejection device. This method involves etching a semiconductor substrate by applying a photoresist etch mask layer to the device surface. The process includes masking, imaging, and developing specific areas of the photoresist etch mask. Additionally, a second area of the mask is irradiated to facilitate the post-etch stripping of the mask layer. The substrate is then etched to create fluid supply slots, significantly reducing mask layer residue. Another notable patent is for a micro-fluid ejection assembly, which features a silicon substrate with a fluid supply slot formed through an etch process.

Career Highlights

Karthik Vaideeswaran is currently employed at Lexmark International, Inc., where he continues to innovate in the field of micro-fluid technology. His work has not only contributed to the company's success but has also positioned him as a leader in his area of expertise.

Collaborations

Karthik has collaborated with notable colleagues such as Girish Shivaji Patil and John William Krawczyk. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Karthik Vaideeswaran's contributions to micro-fluid ejection technology exemplify his innovative spirit and dedication to advancing the field. His patents and collaborations reflect a commitment to excellence in engineering and invention.

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