Karen Lynne Holloway

Title: Inventor Spotlight: Karen Lynne Holloway

Introduction

Karen Lynne Holloway, an accomplished inventor based in Poughkeepsie, NY, has made significant contributions to the field of semiconductor technology. With a total of eight patents to her name, Holloway's work focuses on innovative alignment methods that enhance the manufacturing process of integrated circuits.

Latest Patents

Holloway's most recent patents include a "Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout." This invention features an integrated circuit device that utilizes a specialized alignment mark comprising three coded regions, ensuring precision in alignment despite geometric variances. Additionally, she developed a "Process-robust alignment mark structure for semiconductor wafers," which involves a unique alignment mark structure made up of segments in a repeating base pattern, improving the reliability and efficiency of semiconductor substrates.

Career Highlights

Throughout her career, Karen has worked with prominent companies such as IBM and Infineon AG. Her experience at these institutions has helped her refine her skills and contribute meaningful advancements to the semiconductor industry. Karen's work is particularly appreciated for its practical applications in enhancing the accuracy of semiconductor manufacturing processes.

Collaborations

In her professional journey, Karen Lynne Holloway has collaborated with distinguished colleagues, including James M. Harper and Thomas Y. Kwok. These partnerships have facilitated knowledge exchange and fostered innovation in their projects, allowing for the development of groundbreaking technologies in alignment methods.

Conclusion

Karen Lynne Holloway is a noteworthy figure in the field of innovation, particularly in semiconductor technology. Her eight patents reflect her dedication to advancing the industry, and her collaborations with esteemed colleagues and reputable companies underscore her impact as an inventor. With ongoing contributions, Holloway continues to inspire future generations of inventors and engineers in the pursuit of technological excellence.