Karen D Badger

Title: The Innovative Contributions of Karen D Badger

Introduction

Karen D Badger is a prominent inventor based in Milton, Vermont. She has made significant contributions to the field of technology, particularly in the area of mask inspection tools and multi-layer reticles. With a total of 8 patents to her name, Badger's work has had a substantial impact on the industry.

Latest Patents

Among her latest patents is the "Mask program defect test," which presents a method for characterizing the resolution of mask inspection tools using a test mask and a database containing defect data. This innovative approach allows for the inspection of defect-free masks by programming various defect types and sizes into the database. Another notable patent is the "Method and system for inspecting multi-layer reticles." This method involves selecting a multi-layer reticle with an array of cells and defining a full inspection region. It also includes a process for reducing the inspection region when certain conditions regarding dummy cells are met, thereby enhancing the efficiency of defect inspection.

Career Highlights

Karen D Badger is currently employed at International Business Machines Corporation (IBM), where she continues to develop her innovative ideas and contribute to technological advancements. Her work at IBM has allowed her to collaborate with other talented professionals in the field.

Collaborations

Some of her notable coworkers include Christopher Karl Magg and David L Katcoff. Their collaborative efforts have further enriched the projects they have worked on together.

Conclusion

Karen D Badger's contributions to technology through her patents and work at IBM highlight her role as a leading inventor in her field. Her innovative methods for inspecting masks and multi-layer reticles demonstrate her commitment to advancing technology and improving industry standards.