The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Aug. 31, 2005
Karen D. Badger, Milton, VT (US);
David L. Katcoff, Jericho, VT (US);
Jeffrey P. Lissor, Plainfield, VT (US);
Christopher K. Magg, Jericho, VT (US);
Karen D. Badger, Milton, VT (US);
David L. Katcoff, Jericho, VT (US);
Jeffrey P. Lissor, Plainfield, VT (US);
Christopher K. Magg, Jericho, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods, systems, program storage devices and computer program products for mask inspection that automate the detection and placement of do not inspect regions ('DNIR') for intentionally induced defects on masks. A location of an intentional defect is identified on a mask, and then logic relating to this location is translated into a shape that represents a DNIR for the intentional defect. A second shape representing another DNIR of the mask is provided. It is then determined if the first and second shapes for DNIRs violate a processing rule of the inspection tool, and if so, the violated rule is corrected for by generating a single contiguous DNIR by overlapping the first and second shapes. The inspection tool then utilizes the first and second shapes representing DNIRs, along with any single contiguous DNIRs, to inspect the mask for unintentional defects while avoiding intentional defects.