Jeffrey P Lissor

Title: Innovations by Jeffrey P Lissor

Introduction

Jeffrey P Lissor is an accomplished inventor based in Plainfield, Vermont. He has made significant contributions to the field of mask inspection technology, holding a total of 2 patents. His work focuses on automating the detection and placement of do not inspect regions (DNIR) for intentionally induced defects on masks.

Latest Patents

Lissor's latest patents include innovative methods, systems, program storage devices, and computer program products for mask inspection. One of his notable inventions is a method for mask inspection DNIR replacement based on the location of tri-tone level database images. This invention automates the detection and placement of DNIRs for intentionally induced defects on masks. The process involves identifying the location of an intentional defect on a mask and translating this information into a shape that represents a DNIR. Additionally, it determines if the DNIR shapes violate any processing rules of the inspection tool, correcting any violations by generating a single contiguous DNIR. This technology allows the inspection tool to effectively inspect masks for unintentional defects while avoiding intentional defects.

Career Highlights

Jeffrey P Lissor is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of mask inspection technology. His expertise and contributions have made a significant impact on the industry.

Collaborations

Lissor has collaborated with notable colleagues, including Karen D Badger and David L Katcoff, enhancing the development of advanced technologies in his field.

Conclusion

Jeffrey P Lissor's work in mask inspection technology showcases his innovative spirit and dedication to improving industry standards. His patents reflect a commitment to advancing technology and ensuring quality in manufacturing processes.