Essex Junction, VT, United States of America

Christopher Karl Magg


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Jericho, VT (US) (2008 - 2009)
  • Essex Junction, VT (US) (2003 - 2010)

Company Filing History:


Years Active: 2003-2010

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8 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Christopher Karl Magg

Introduction

Christopher Karl Magg is a notable inventor based in Essex Junction, Vermont. He has made significant contributions to the field of optical lithography, holding a total of 8 patents. His work primarily focuses on improving inspection systems for masks used in lithography, which are crucial for semiconductor manufacturing.

Latest Patents

Magg's latest patents include groundbreaking technologies that enhance the efficiency and accuracy of mask inspections. One of his notable inventions is the "Alternating phase shift mask inspection using biased inspection data." This system utilizes inspection data that is biased to compensate for mismatches that occur when using an optical lithography system to print masks. Another significant patent is the "Mask inspection DNIR replacement based on location of tri-tone level database images—2P shapes." This invention automates the detection and placement of do not inspect regions (DNIR) for intentionally induced defects on masks, ensuring that unintentional defects are accurately identified while avoiding intentional ones.

Career Highlights

Christopher Karl Magg is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of optical lithography. His expertise and contributions have positioned him as a key figure in advancing technologies that are essential for modern semiconductor manufacturing.

Collaborations

Magg has collaborated with several talented individuals in his field, including Karen D Badger and Marie Angelopoulos. These collaborations have further enriched his work and contributed to the development of innovative solutions in mask inspection technologies.

Conclusion

Christopher Karl Magg's contributions to the field of optical lithography through his patents and collaborations highlight his role as a leading inventor. His work continues to influence the semiconductor industry, ensuring advancements in technology and efficiency.

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