The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Nov. 03, 2004
James W. Adkisson, Jericho, VT (US);
Eric M. Coker, Burlington, VT (US);
Christopher K. Magg, Jericho, VT (US);
Jed H. Rankin, Richmond, VT (US);
Anthony K. Stamper, Williston, VT (US);
James W. Adkisson, Jericho, VT (US);
Eric M. Coker, Burlington, VT (US);
Christopher K. Magg, Jericho, VT (US);
Jed H. Rankin, Richmond, VT (US);
Anthony K. Stamper, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for correction of defects in lithography masks includes determining the existence of mask defects on an original mask, and identifying a stitchable zone around each of the mask defects found on the original mask. Each of the identified stitchable zones on the original mask is blocked out such that circuitry within the stitchable zones is not printed out during exposure of the original mask. A repair mask is formed, the repair mask including corrected circuit patterns from each of the identified stitchable zones.