The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2011
Filed:
Mar. 07, 2008
Karen D. Badger, Milton, VT (US);
Jim B. Densmore, Morrisville, VT (US);
Christopher R. Gillman, Burlington, VT (US);
Kathleen G. Purdy, Richmond, VT (US);
Cynthia Whiteside, Charlotte, VT (US);
Karen D. Badger, Milton, VT (US);
Jim B. Densmore, Morrisville, VT (US);
Christopher R. Gillman, Burlington, VT (US);
Kathleen G. Purdy, Richmond, VT (US);
Cynthia Whiteside, Charlotte, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method optimizes photomask inspection. After masks are manufactured, the method predicts the likelihood that the masks will be defect free based on defect criteria, etch area, etch mode, and etch tool type associated with the masks. The method skips an initial mask inspection for masks that have a predictability value above a predetermined value and performs the initial mask inspection for masks that have a predictability value below the predetermined value. After initial inspection is preformed (or skipped), a pellicle is mounted on the mask and then all masks are inspected or reinspected for defects and foreign matter.