This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2011.
Company Filing History:
Years Active: 2011
Title: Jim B Densmore: Innovator in Photomask Image Inspection
Introduction
Jim B Densmore is a notable inventor based in Morrisville, VT (US). He has made significant contributions to the field of photomask inspection, particularly through his innovative methods that enhance the efficiency and accuracy of the inspection process.
Latest Patents
Densmore holds 1 patent for his invention titled "Photomask image inspection." This method optimizes the inspection of photomasks by predicting the likelihood that the masks will be defect-free based on various criteria. These criteria include defect criteria, etch area, etch mode, and etch tool type associated with the masks. The method allows for skipping the initial mask inspection for those masks that have a predictability value above a predetermined threshold, while performing the inspection for those below it. After the initial inspection is conducted or skipped, a pellicle is mounted on the mask, followed by a comprehensive inspection for defects and foreign matter.
Career Highlights
Densmore is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to develop and refine his innovative methods, contributing to advancements in the semiconductor manufacturing industry.
Collaborations
Throughout his career, Densmore has collaborated with talented colleagues, including Cynthia Whiteside and Kathleen G Purdy. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in photomask inspection.
Conclusion
Jim B Densmore's contributions to photomask image inspection exemplify the impact of innovation in technology. His methods not only enhance the efficiency of the inspection process but also contribute to the overall quality of semiconductor manufacturing.