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For the Inventor, By the Inventor

Shiga, Japan

Kaoru Shinbara

This inventor holds 6 USPTO granted patents. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1988-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaoru Shinbara. Retrieved from https://idiyas.com/inventor/kaoru-shinbara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 6

Forward Citations = 343(Granted Patents)


Location History:

  • Kusatsu, JP (1988)
  • Hikone, JP (1992 - 1994)
  • Shiga-ken, JP (2000)
  • Shiga, JP (1996 - 2001)

Company Filing History:

goldMedal6 out of 1,306 
 
Dainippon Screen Mfg. Co., Ltd.
 patents

Years Active: 1988-2001

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6 patents (USPTO):Explore Patents
1. 6273104 - Method of and apparatus for processing substrate (2001-08-14),
2. 6155275 - Substrate processing unit and substrate processing apparatus using the (2000-12-05),
3. 5485644 - Substrate treating apparatus (1996-01-23),
4. 5288333 - Wafer cleaning method and apparatus therefore (1994-02-22),
5. 5158100 - Wafer cleaning method and apparatus therefor (1992-10-27),
6. 4788994 - Wafer holding mechanism (1988-12-06),

Title: Kaoru Shinbara: Innovator in Substrate Processing Technology

Introduction

Kaoru Shinbara is a prominent inventor based in Shiga, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 6 patents. His innovative approaches have enhanced the quality and efficiency of substrate processing, making him a key figure in this industry.

Latest Patents

Shinbara's latest patents include a method and apparatus for processing substrates. This invention features a blocking plate that faces a substrate held by a substrate holding device. A processing fluid is supplied to the substrate's surface while an inert gas is introduced into the space between the substrate and the blocking plate. This design prevents turbulence that could lead to pollutants adhering to the substrate, thereby improving its quality. Another notable patent is a substrate processing unit that includes a processing section for substrates, an enclosure with an opening for substrate transport, and a process fluid pipe for supplying the necessary fluids. This apparatus is designed to enhance the efficiency of substrate processing by utilizing multiple units arranged in a coordinated manner.

Career Highlights

Kaoru Shinbara has built a successful career at Dainippon Screen Mfg. Co., Ltd., where he has been instrumental in developing advanced substrate processing technologies. His work has not only contributed to the company's reputation but has also pushed the boundaries of what is possible in substrate processing.

Collaborations

Throughout his career, Shinbara has collaborated with talented individuals such as Hitoshi Yoshioka and Masato Tanaka. These collaborations have fostered innovation and have led to the development of groundbreaking technologies in the field.

Conclusion

Kaoru Shinbara's contributions to substrate processing technology are noteworthy and impactful. His innovative patents and career achievements reflect his dedication to advancing this field. His work continues to influence the industry and improve substrate processing methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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