Kannan Balasundaram

Title: Innovations of Kannan Balasundaram

Introduction

Kannan Balasundaram is an accomplished inventor based in Gainesville, FL (US). He has made significant contributions to the field of chemical mechanical polishing (CMP) with a total of 3 patents to his name. His work focuses on enhancing the efficiency and effectiveness of polishing processes for various substrates.

Latest Patents

Kannan's latest patents include innovative methods for chemical mechanical polishing of alumina. One notable patent describes a CMP method that utilizes a slurry containing colloidal metal oxide or semiconductor oxide particles in water. This method allows for the polishing of alumina surfaces using a rotating polishing pad, with specific parameters for polydispersity and particle size to optimize the process. Another patent involves polishing hard substrates with soft-core composite particles, where a slurry containing composite particles is used to achieve superior polishing results on substrates with high hardness.

Career Highlights

Throughout his career, Kannan has worked with notable organizations such as Sinmat, Inc. and the University of Florida Research Foundation, Incorporated. His experience in these institutions has allowed him to develop and refine his innovative polishing techniques, contributing to advancements in the field.

Collaborations

Kannan has collaborated with esteemed colleagues, including Rajiv K Singh and Arul Arjunan. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Kannan Balasundaram's contributions to the field of chemical mechanical polishing demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and engineering, positioning him as a key figure in advancing polishing technologies.